Substrate effect on microstructure and optical performance of sputter-deposited TiO2 thin films

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dc.authorid0000-0002-6476-8639en_US
dc.authorid0000-0002-5177-3703en_US
dc.contributor.authorYıldırım, Gürcan
dc.contributor.authorBal, S.
dc.contributor.authorGülen, M.
dc.contributor.authorVarilci, Ahmet
dc.contributor.authorBudak, Erhan
dc.contributor.authorAkdoğan, Mustafa
dc.date.accessioned2021-06-23T19:33:54Z
dc.date.available2021-06-23T19:33:54Z
dc.date.issued2012
dc.departmentBAİBÜ, Fen Edebiyat Fakültesi, Fizik Bölümüen_US
dc.description.abstractThis study deals with the role of the different substrates on the microstructural, optical and electronical properties of TiO2 thin films produced by conventional direct current (DC) magnetron sputtering in a mixture of pure argon and oxygen using a Ti metal target with the aid of Xray diffractometer (XRD), ultra violet spectrometer (UVvis) and atomic force microscopy (AFM) measurements. Transparent TiO2 thin films are deposited on Soda lime glass, MgO(100), quartz and sitall substrates. Phase purity, surface morphology, optical and photocatalytic properties of the films are compared with each other. It is found that the amplitude of interference oscillation of the films is in a range of 77-89%. The transmittance of the film deposited on Soda lime glass is the smallest while the film produced on MgO(100) substrate obtains the maximum transmittance value. The refractive index and optical band gap of the TiO2 thin films are also inferred from the transmittance spectra. The results show that the film deposited on Soda lime glass has the better optical property while the film produced on MgO(100) substrate exhibits much better photoactivity than the other films because of the large optical energy band gap. As for the XRD results, the film prepared on MgO(100) substrate contains the anatase phase only; on the other hand, the other films contain both anatase and rutile phases. Furthermore, AFM images show that the regular structures are observed on the surface of all the films studied. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)en_US
dc.identifier.doi10.1002/crat.201100614
dc.identifier.endpage201en_US
dc.identifier.issn0232-1300
dc.identifier.issn1521-4079
dc.identifier.issue2en_US
dc.identifier.scopus2-s2.0-84856739538en_US
dc.identifier.scopusqualityQ3en_US
dc.identifier.startpage195en_US
dc.identifier.urihttps://doi.org/10.1002/crat.201100614
dc.identifier.urihttps://hdl.handle.net/20.500.12491/7269
dc.identifier.volume47en_US
dc.identifier.wosWOS:000299834700011en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.institutionauthorYıldırım, Gürcan
dc.institutionauthorBudak, Erhan
dc.institutionauthorVarilci, Ahmet
dc.institutionauthorAkdoğan, Mustafa
dc.institutionauthorBal, S.
dc.institutionauthorGülen, M.
dc.language.isoenen_US
dc.publisherWiley-V C H Verlag Gmbhen_US
dc.relation.ispartofCrystal Research And Technologyen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectTiO2 thin filmsen_US
dc.subjectDC sputteren_US
dc.subjectXRDen_US
dc.subjectAFMen_US
dc.subjectUV-Vis Spectraen_US
dc.titleSubstrate effect on microstructure and optical performance of sputter-deposited TiO2 thin filmsen_US
dc.typeArticleen_US

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