Substrate effect on microstructure and optical performance of sputter-deposited TiO2 thin films
Yükleniyor...
Tarih
2012
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Wiley-V C H Verlag Gmbh
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
This study deals with the role of the different substrates on the microstructural, optical and electronical properties of TiO2 thin films produced by conventional direct current (DC) magnetron sputtering in a mixture of pure argon and oxygen using a Ti metal target with the aid of Xray diffractometer (XRD), ultra violet spectrometer (UVvis) and atomic force microscopy (AFM) measurements. Transparent TiO2 thin films are deposited on Soda lime glass, MgO(100), quartz and sitall substrates. Phase purity, surface morphology, optical and photocatalytic properties of the films are compared with each other. It is found that the amplitude of interference oscillation of the films is in a range of 77-89%. The transmittance of the film deposited on Soda lime glass is the smallest while the film produced on MgO(100) substrate obtains the maximum transmittance value. The refractive index and optical band gap of the TiO2 thin films are also inferred from the transmittance spectra. The results show that the film deposited on Soda lime glass has the better optical property while the film produced on MgO(100) substrate exhibits much better photoactivity than the other films because of the large optical energy band gap. As for the XRD results, the film prepared on MgO(100) substrate contains the anatase phase only; on the other hand, the other films contain both anatase and rutile phases. Furthermore, AFM images show that the regular structures are observed on the surface of all the films studied. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
Açıklama
Anahtar Kelimeler
TiO2 thin films, DC sputter, XRD, AFM, UV-Vis Spectra
Kaynak
Crystal Research And Technology
WoS Q Değeri
Q3
Scopus Q Değeri
Q3
Cilt
47
Sayı
2
