Morphological, microstructural and electrical examinations on ZnO film on p-Si wafer
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Dosyalar
Tarih
2012
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Springer
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
This study reports not only main electrical and dielectric characteristics of Ag/ZnO/p-Si heterostructure with the aid of the experimental admittance measurements at room temperature and theoretical approaches but also the microstructure and surface morphology of the heterostructure by means of X-ray diffraction, scanning electron microscopy and atomic force microscopy measurements. The results obtained show that the sample, obtaining Wurtzite structure with the (002) preferred orientation, has a fine crystalline microstructure consisting of micro-sized hexagonal rods growing uniformly in large scale on the film surface. When the diameters of the rods are found to vary from 0.5 mu m to 1.5 mu m, thickness values are observed to be about 2 mu m. Further, series resistance (R-s) and some other electronic parameters of the heterostructure are obtained by the capacitance-voltage (C-V), conductance-voltage (G-V) and C-2-V measurements. Moreover, voltage (V) and frequency (f) dependence of dielectric parameters such as dielectric constant (epsilon'), dielectric loss (epsilon aEuro(3)), dielectric loss tangent (tan delta), real and imaginary parts of electric modulus (IeaEuro(2) and IeaEuro(3)) are determined and discussed. It is found that both electrical and dielectric parameters of the heterostructure prepared in this work depend strongly on the applied bias voltage and frequency.
Açıklama
Anahtar Kelimeler
ZnO Film
Kaynak
Journal Of Materials Science-Materials In Electronics
WoS Q Değeri
Q2
Scopus Q Değeri
Q2
Cilt
23
Sayı
11
