Now showing items 1-2 of 2
Role of annealing environment and partial pressure on structure and optical performance of TiO2 thin films fabricated by RF sputter method
(Wiley-V C H Verlag Gmbh, 2010)
Influences of the different annealing ambient (in air, 1 bar, 2 bar, 3 bar and 4 bar oxygen partial pressure) on the titanium dioxide (TiO2) thin films deposited on soda lime glass by standard radio frequency (RF) magnetron ...
Substrate effect on microstructure and optical performance of sputter-deposited TiO2 thin films
(Wiley-V C H Verlag Gmbh, 2012)
This study deals with the role of the different substrates on the microstructural, optical and electronical properties of TiO2 thin films produced by conventional direct current (DC) magnetron sputtering in a mixture of ...